Prof. Dr. Niklas Nilius

Carl von Ossietzky Universität Oldenburg
Fakultät V - Institute of Physics
D-26111 Oldenburg


Room: W2 3-327a


Meike Hurling


Room: W2 1-133



170. Growth of Self-Passivating Oxide Layers on Aluminum – Pressure and Temperature Dependence
J. Gorobez, B. Maack, N. Nilius
Phys. Status Solidi B 258 (2021) 2000559 1-7

171. Electron stimulated desorption of vanadyl-groups from vanadium oxide thin films on Ru(0001) probed with STM
Y. Wang, P. I. Wemhoff, M. Lewandowski, N. Nilius
Phys. Chem. Chem. Phys 23 (2021) 8439 – 8445

172. Laser Stimulation of MoSe2/Au(111) in an STM Junction: Photo versus Thermally Induced Current Response
B. Lübken and  N. Nilius
Phys. Rev. B 103 (2021) 245420


(Changed: 2021-09-06)